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CSIC TIC009- Process for local oxidation of surfaces to fabricate sub-micrometric or nanometric structures
A Spanish research institute joined to an Italian research institute has patented a new process for local oxidation of surfaces so as fabricate sub-micrometric or nanometric structures on a large area of a surface. The process results in fabrication of a surface with special modulation of the chemical and topography across a large area. This process is efficient, simple and has a low cost. The institute is looking for industrial partners for a license agreement in the microelectronics sector
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DESCRIPTION

Despite the continuous development of new nano-manufacturing methods, applied also to organic materials, nowadays photolithography remains the workhorse in the microelectronics industry. Although photolithography is applicable on large areas and it is reliable for production, the costs of the infrastructures, instrumentation, materials and processing increase exponentially with decreasing of the dimensions of the fabricated objects. Serial fabrication techniques, such as electron beam lithography and focused ion beam milling, are fabrication aimed to production because of low throughput.

This technology provides a process for local oxidation of surface so as to fabricate sub-micrometric or nano-metric structures on a large area of the surface. These structures have a different chemical composition with respect to the pristine regions of the surface and they in general protrude out of the surface as mounds (hillocks). Chemical etching of the mounds yields pits, the chemical composition whereof may be similar to that of the pristine regions. Thus, the process results in fabrication of a surface with special modulation of the chemical and/or topography across a large area. This process is efficient, simple and has a low cost.

This technology provides a process that allows performing local oxidation of the silicon water surface, even covered by a layer of oxide, with spatial control on the nanometre scale and across an area of several squared centimetres at least.

INNOVATIVE ASPECTS

A process that allows performing local oxidation of the silicon water surface, even covered by a layer of oxide, with spatial control on the nanometre scale and across an area of several squared centimetres at least. This process permits the fabrication of a surface with special modulation of the chemical and topography across a large area

COMPETITIVE ADVANTAGES

This technology includes a procedure for the fabrication of sub-micrometric or nano-metric structures on large areas at lower costs that the conventional method used nowadays

KEYWORDS

Surface treatment (painting, galvano, polishing, CVD, PVD);Materials Technology;Computer Software

PATENT

Patent(s) granted

CONTACT

Javier Maira
email: j.maira@orgc.csic.es
phone: +34 915854954

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